On April 4, 2019, Ge, Jhih Kuei; Lee, Yi-Chia; Liu, Wen Dar; Kuo, Chi-Hsien published a patent.COA of Formula: C9H9N3 The title of the patent was Stripper solutions and methods of using stripper solutions. And the patent contained the following:
The invention relates to a stripper solution for removing a resist from a substrate, comprising one or more than one organic solvent, water, hydroxylamine or one or more than one derivative of hydroxylamine, one or more than one corrosion inhibitor, optional one or more than one surfactant, and one or more than one quaternary ammonium hydroxide, wherein the quaternary ammonium hydroxide has the formula: R2-N(R1)(R3)-R4, wherein R1, R2, R3, and R4 are alkyl groups, benzyl, aryl groups, or a combination thereof having collectively at least 5 carbons. The invention also relates to a method for removing a resist from a substrate, comprising; (a) providing a substrate having a resist thereon; (b) contacting the substrate with a stripper solution for a time sufficient to remove the resist; (c) removing the substrate from the stripping solution; and {d} rinsing the stripper solution from the substrate with a solvent. An electronic device prepared according to the inventive method is also claimed. The invention also claims a method for preparing a stripper solution, comprising: (a) providing a container; (b) providing components of the stripper solution composition; and (c) adding components of stripper solution to container to provide contents. The experimental process involved the reaction of 4-(p-Tolyl)-1H-1,2,3-triazole(cas: 5301-96-2).COA of Formula: C9H9N3
The Article related to cleaning composition stripper photoresist removal electronic device fabrication, Surface Active Agents and Detergents: Cleaning Compositions and other aspects.COA of Formula: C9H9N3
Referemce:
1,2,3-Triazole – Wikipedia,
Triazoles – an overview | ScienceDirect Topics